Xradia 520 Versa frees researchers to push the boundaries of lab-based imaging. With prominent facilities worldwide using non-destructive X-ray microscopy (XRM) to extend the use of valuable samples, the ZEISS Xradia Versa family proves a powerful component of a correlative microscopy solution.
Xradia 520 Versa adds a host of innovations to ZEISS Xradia's industry-leading resolution, contrast and powerful advantages for conducting in situ studies under native or controlled conditions. The instrument delivers compositional contrast for better discernment between materials appearing nearly identical, faster time-to-results for time-sensitive applications, and superior ease-of-use for multi-user environments.
Xradia Versa solutions are ideal for highly skilled users as well as busy imaging labs with diverse user needs and skillsets. Breakthrough applications for Xradia 520 Versa include compositional contrast in materials science, high aspect ratio tomography for semiconductor failure analysis and 4D studies of material evolution over time. Highlights include advanced contrast tuning capabilities, extensive filtering options, and faster time to results with higher throughput.