By adding focused ion beam secondary ion mass spectrometry (FIB-SIMS) capabilities to FIB-SEM microscopes, TOFWERK’s fibTOF allows sensitive chemical imaging with nanometer resolution and in three dimensions.
- Allows sensitive detection of light elements, like hydrogen, fluorine, lithium and boron
- Enables 3D chemical imaging of all elements with depth profiling resolution of less than 10 nm and lateral resolution of less than 50 nm
- Explicit elemental identification with a high mass resolving power
- Isotopic imaging for experiments to analyze diffusion, transport, or reaction mechanisms
- Can be used with leading commercially available FIB-SEM microscopes without affecting the quality of images
Advancing FIB-SIMS without compromise
The fibTOF instrument adds 3D chemical imaging capabilities to FIB-SEM microscopes.
Secondary ion mass spectrometry (SIMS) is a proven method where a powerful beam of ions is used for sample sputtering. This causes the ejection of both charged particles (secondary ions) and neutral particles.
The sputtered ions are quantified by a mass analyzer, offering chemical data about the specimen. SIMS has a superior depth resolution (the secondary ions come solely from the sample surface) and exceptional lateral resolution when an appropriately fine primary ion beam is scanned over the specimen.
Image Credit: TOFWERK
The combination of fibTOF and FIB-SEM microscope allows SIMS measurements with exceptional imaging performance without affecting EDX/SEM measurements. The time-of-flight mass analyzer of the fibTOF invariably acquires an entire mass spectrum, making it possible to visualize any target ions during the post-processing of data.
3D chemical imaging
In the following image, the fibTOF data set shows the dispersion of aluminum ions in the top layers of a vertical-cavity surface-emitting laser. In this case, the vertical scale has been exaggerated and matches to a depth of less than 2 µm. The field of view is 10 x 10 µm.
Image Credit: Image provided by Empa