The 7500 represents a fresh look at Broad Ion Beam Milling. The system is designed around our new 50 cm plasma source and a new high reliability rotary substrate table.
The ion source is the largest from our series of RF excited ion beam generators. By matching the attributes of the large plasma generator to a very robust accelerator the ion source delivers ground breaking performance in terms of beam quality.
The ion accelerators used in these systems are customised to achieve maximum benefit to the application. All are characterised by a robust structure and class leading beam quality delivering perveance matched beams with optimised emittance to deliver tight low divergent broad beams. They deliver the performance needed when manufacturing a nano scale world.