The Solarus® II plasma cleaner represents the next generation of plasma tools designed for the removal of hydrocarbon contamination from TEM and SEM samples and holders.
This system is ideal for researchers seeking a safe and efficient method to reproducibly remove organic surface contaminants.
- Low-power operation (2 W): Gently clean delicate samples (e.g., holey carbon grids), as well as prepare hydrophilic surfaces on carbon grids for cryo-electron microscopy.
- Enhanced user interface: Use preoptimized recipes for consistent results, as well as guided workflows to ensure proper operation when venting and evacuating the chamber.
- Integrated holder bakeout and storage: Reduces tool footprint and cost of ownership.
- New system, same great performance: Remove hydrocarbons on TEM and SEM samples that may impact analysis.
Minimize surface damage and maintain the integrity of silicon
Minimize surface damage and maintain the integrity of silicon. After plasma cleaning with the Solarus II, there is minimal amorphous surface damage and the sample integrity is maintained. Protocol: hydrogen and oxygen; duration: 5 min; sample: silicon 110; TEM image: TF20. Video Credit: Gatan, Inc.
Remove hydrocarbon accumulation on semiconductor device
Remove hydrocarbon accumulation on semiconductor device. After cleaning with the Solarus II system, amorphous surface damage and crosslinking are eliminated. Protocol: hydrogen and oxygen; duration: 5 min; sample: a semiconductor device; SEM image. Video Credit: Gatan, Inc.