Supportive work environments significantly reduce psychiatric nurse burnout

A new study published in the Journal of Psychiatric and Mental Health Nursing reveals that four in ten inpatient psychiatric mental health registered nurses (PMH-RNs) experience high burnout. However, researchers found that supportive work environments significantly reduce burnout, job dissatisfaction, and nurse turnover.

The research – from Penn Nursing's Center for Health Outcomes and Policy Research (CHOPR) – evaluated survey data from 740 inpatient PMH-RNs across 297 general acute care and psychiatric hospitals in ten US states.

Key findings of the study include:

• Widespread Burnout & Turnover: Approximately 38% of psychiatric nurses reported high burnout, 29.5% experienced job dissatisfaction, and 22% planned to leave their employer within a year.
• Work Environment Impact: For every one-point increase in the quality of the work environment, nurses experienced a 70% decrease in the odds of burnout, a 59% decrease in job dissatisfaction, and a 53% decrease in intent to leave.
• Staffing is Critical: Staffing adequacy received the lowest ratings among organizational factors and was the primary driver associated with improvements across all job outcomes.

High levels of burnout and turnover among PMH-RNs are not inevitable. Improving work environments-specifically through ensuring adequate staffing levels and empowering PMH-RNs through strong leadership support-represents an actionable strategy for healthcare systems to retain this workforce central to caring for patients experiencing acute mental health crises."

Justinna Dixon, PhD, RN, lead author, dually appointed CHOPR and National Clinician Scholars Program Postdoctoral Fellow

With nearly half of the psychiatric nursing workforce expected to retire over the next decade, study authors call on administrators and policymakers to prioritize optimal staffing models and supportive interdisciplinary teamwork, collaboration, and safe physical & psychological environments for PMH- RNS.